Electromigration Analysis

Electromigration — migration of metal atoms in a conductor due to an electrical current — is typically not a problem in most electronics systems. However, in high-speed electronics, the increased performance and smaller form factors lead to increased current densities across very thin traces causing electromigration. This phenomenon is a major threat to the reliability of high-speed electronic products. ANSYS SIwave can now predict electromigration and mean time-to-failure of a design.

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